Press Releases

Mimaki Engineering Announces Participation in ADAPT Consortium Launched by Massachusetts Institute of Technology (MIT)

Published

5 years ago

January 3, 2019

Mimaki Engineering Co., Ltd., parent copy of Mimaki USA, announces its participation as one of the founding members of the ADAPT (Additive and Digital Advanced Production Technologies) consortium launched by the Massachusetts Institute of Technology (MIT).

ADAPT is a consortium directed by Professor John Hart, who leads the MIT Laboratory for Manufacturing and Productivity. With the aim of supporting the advancement of the additive manufacturing (AM) industry, ADAPT will promote research and education for next-generation manufacturing technology based upon AM processes, which includes 3D printing.

“We’ve been given the opportunity to install our UV-LED flatbed printer [UJF-7151 plus] and 3D printer [3DUJ-553] at MIT to support AM-related classes and research. Working towards ADAPT’s vision for the amalgamation and evolution of AM technology and digital production, Mimaki will continue to contribute to ADAPT activities through our inkjet technology and mass customization printing solutions,” said Yasuhiro Haba, executive general manager of sales division at Mimaki Engineering Co., Ltd. “Additionally, Mimaki will utilize the feedback gained through ADAPT activities to help with future product development. We are honored to be selected as one of the founding members of MIT’s ADAPT.”

ADAPT’s founding members hosted a kick-off meeting at the international trade fair for addictive manufacturing and industrial production, Formnext, held in Frankfurt, Germany in November. The next meeting will be in spring 2019 at MIT.

ADAPT founding members include: ArcelorMittal, BigRep GmbH, Dentsply Sirona, Electro-Optical Systems, Formlabs, General Motors, Mimaki Engineering, Protolabs, Renishaw, Robert Bosch GmbH, and Volkswagen AG.

**Pictured: Mimaki Engineering Chairman Akira Ikeda and MIT Professor John Hart at the MIT manufacturing lab and build space.

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